Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
description
2018 nî lūn-bûn
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2018年の論文
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2018年学术文章
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2018年学术文章
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2018年学术文章
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2018年学术文章
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2018年学术文章
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2018年學術文章
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2018年學術文章
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name
Tuning Material Properties of ...... and 3D Substrate Topographies.
@en
Tuning Material Properties of ...... and 3D Substrate Topographies.
@nl
type
label
Tuning Material Properties of ...... and 3D Substrate Topographies.
@en
Tuning Material Properties of ...... and 3D Substrate Topographies.
@nl
prefLabel
Tuning Material Properties of ...... and 3D Substrate Topographies.
@en
Tuning Material Properties of ...... and 3D Substrate Topographies.
@nl
P2093
P2860
P50
P356
P1476
Tuning Material Properties of ...... and 3D Substrate Topographies
@en
P2093
Akhil Sharma
Cristian A A van Helvoirt
Dennis M Hausmann
Harm C M Knoops
Mariadriana Creatore
Vivek Beladiya
P2860
P304
13158-13180
P356
10.1021/ACSAMI.8B00183
P407
P577
2018-04-09T00:00:00Z