Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning.
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Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning.
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2018 nî lūn-bûn
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2018年の論文
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2018年学术文章
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2018年学术文章
@zh-cn
2018年学术文章
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2018年学术文章
@zh-my
2018年学术文章
@zh-sg
2018年學術文章
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2018年學術文章
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2018年學術文章
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name
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@en
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@nl
type
label
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@en
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@nl
prefLabel
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@en
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@nl
P2860
P356
P1476
Heterostuctures of 4-(chlorome ...... main steps of nanopatterning.
@en
P2093
Jayne C Garno
P2860
P304
P356
10.3762/BJNANO.9.112
P577
2018-04-17T00:00:00Z