Chemical modification of colloidal masks for nanolithography.
about
Chemical modification of colloidal masks for nanolithography.
description
2008 nî lūn-bûn
@nan
2008年の論文
@ja
2008年学术文章
@wuu
2008年学术文章
@zh
2008年学术文章
@zh-cn
2008年学术文章
@zh-hans
2008年学术文章
@zh-my
2008年学术文章
@zh-sg
2008年學術文章
@yue
2008年學術文章
@zh-hant
name
Chemical modification of colloidal masks for nanolithography.
@en
Chemical modification of colloidal masks for nanolithography.
@nl
type
label
Chemical modification of colloidal masks for nanolithography.
@en
Chemical modification of colloidal masks for nanolithography.
@nl
prefLabel
Chemical modification of colloidal masks for nanolithography.
@en
Chemical modification of colloidal masks for nanolithography.
@nl
P2093
P356
P1433
P1476
Chemical modification of colloidal masks for nanolithography.
@en
P2093
Alfons van Blaaderen
Dirk L J Vossen
Joan J Penninkhof
P304
P356
10.1021/LA703847P
P407
P577
2008-05-07T00:00:00Z