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Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics.Nanoscale neuroelectrode modification via sub-20 nm silicon nanowires through self-assembly of block copolymers.Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application.Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer.In-depth TEM characterization of block copolymer pattern transfer at germanium surfaces.Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing.Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces.Surface Modification of Absorbable Magnesium Stents by Reactive Ion EtchingSolvent vapor annealing of block copolymers in confined topographies: commensurability considerations for nanolithographyStudy of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing
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description
onderzoeker
@nl
researcher
@en
հետազոտող
@hy
name
Cian Cummins
@ast
Cian Cummins
@en
Cian Cummins
@es
Cian Cummins
@nl
Cian Cummins
@sl
type
label
Cian Cummins
@ast
Cian Cummins
@en
Cian Cummins
@es
Cian Cummins
@nl
Cian Cummins
@sl
prefLabel
Cian Cummins
@ast
Cian Cummins
@en
Cian Cummins
@es
Cian Cummins
@nl
Cian Cummins
@sl
P1053
C-8368-2017
P106
P1153
55933740300
P31
P3829
P496
0000-0001-6338-3991