Stress-induced solid flow drives surface nanopatterning of silicon by ion-beam irradiation
about
Distinguishing physical mechanisms using GISAXS experiments and linear theory: the importance of high wavenumbers.Producing nanodot arrays with improved hexagonal order by patterning surfaces before ion sputtering.Surface Morphologies of Ti and Ti-Al-V Bombarded by 1.0-MeV Au+ IonsAnomalous behavior in temporal evolution of ripple wavelength under medium energy Ar+-ion bombardment on Si: A case of initial wavelength selectionIon-beam nanopatterning of silicon surfaces under codeposition of non-silicide-forming impuritiesSymmetry of surface nanopatterns induced by ion-beam sputtering: Role of anisotropic surface diffusionNonuniversality due to inhomogeneous stress in semiconductor surface nanopatterning by low-energy ion-beam irradiation
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P2860
Stress-induced solid flow drives surface nanopatterning of silicon by ion-beam irradiation
description
article
@en
im Dezember 2012 veröffentlichter wissenschaftlicher Artikel
@de
wetenschappelijk artikel
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наукова стаття, опублікована в грудні 2012
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name
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
@en
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
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type
label
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
@en
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
@nl
prefLabel
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
@en
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
@nl
P2093
P2860
P1433
P1476
Stress-induced solid flow driv ...... ilicon by ion-beam irradiation
@en
P2093
J. Muñoz-García
L. Vázquez
P2860
P356
10.1103/PHYSREVB.86.214107
P407
P577
2012-12-19T00:00:00Z