Nanoimprint lithography
Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
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Nanoimprint lithography
Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
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Die Nanoprägelithografie (engl ...... opto-elektronischer Bauteile.
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Nanoimprint lithography (NIL) ...... olled to allow proper release.
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Нанопечатная литография (англ. ...... и элементов электронной схемы.
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ナノインプリント・リソグラフィとは現在開発が進められている半 ...... グラフィには『パーシャルフィールド』という特有の問題もある。
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1,021,986,080
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The mold used
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The resulting lens
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A diffractive lens created using nanoimprint lithography
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Die Nanoprägelithografie (engl ...... opto-elektronischer Bauteile.
@de
Nanoimprint lithography (NIL) ...... olled to allow proper release.
@en
Нанопечатная литография (англ. ...... и элементов электронной схемы.
@ru
ナノインプリント・リソグラフィとは現在開発が進められている半 ...... グラフィには『パーシャルフィールド』という特有の問題もある。
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Nanoimprint lithography
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Nanoprägelithografie
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Нанопечатная литография
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ナノインプリント・リソグラフィ
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