Next-generation lithography
Next-generation lithography or NGL is a term used in integrated circuit manufacturing to describe the lithography technologies in development which are intended to replace current techniques. The term applies to any lithography method which uses a shorter-wavelength light or beam type than the current state of the art, such as X-ray lithography, electron beam lithography, focused ion beam lithography, and nanoimprint lithography. The term may also be used to describe techniques which achieve finer resolution features from an existing light wavelength.
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Next-generation lithography
Next-generation lithography or NGL is a term used in integrated circuit manufacturing to describe the lithography technologies in development which are intended to replace current techniques. The term applies to any lithography method which uses a shorter-wavelength light or beam type than the current state of the art, such as X-ray lithography, electron beam lithography, focused ion beam lithography, and nanoimprint lithography. The term may also be used to describe techniques which achieve finer resolution features from an existing light wavelength.
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Next-generation lithography or ...... d implementation difficulties.
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Unter Next-Generation-Lithogra ...... Nanoprägelithografie oder die
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次世代リソグラフィ(Next-generation lithography NGL)は次世代の集積回路を製造する技術で定義は時代とともに変遷している。
@ja
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Next-generation lithography or ...... an existing light wavelength.
@en
Unter Next-Generation-Lithogra ...... rei Gruppen eingeteilt werden:
@de
次世代リソグラフィ(Next-generation lithography NGL)は次世代の集積回路を製造する技術で定義は時代とともに変遷している。
@ja
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Next-Generation-Lithografie
@de
Next-generation lithography
@en
次世代リソグラフィ
@ja