Pulsed laser deposition
Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.
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Pulsed laser deposition
Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.
has abstract
L'ablation laser pulsé (en ang ...... uire divers alliages binaires.
@fr
Laserstrahlverdampfen, auch La ...... ehälter (Rezipient) platziert.
@de
Pulsed laser deposition (PLD) ...... n the typically hot substrate.
@en
Импульсное лазерное напыление ...... териалом мишени (при абляции).
@ru
脈衝雷射沉積(英語:Pulsed Laser Deposit ...... 於電漿雲中,包含分子、原子、電子、離子、微粒、融球體等物質。
@zh
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L'ablation laser pulsé (en ang ...... uire divers alliages binaires.
@fr
Laserstrahlverdampfen, auch La ...... ehälter (Rezipient) platziert.
@de
Pulsed laser deposition (PLD) ...... oxygenate the deposited films.
@en
Импульсное лазерное напыление ...... териалом мишени (при абляции).
@ru
脈衝雷射沉積(英語:Pulsed Laser Deposit ...... 於電漿雲中,包含分子、原子、電子、離子、微粒、融球體等物質。
@zh
label
Ablation laser pulsé
@fr
Laserstrahlverdampfen
@de
Pulsed laser deposition
@en
Импульсное лазерное напыление
@ru
脉冲激光沉积
@zh