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1.4915613
1.4915613
http://dx.doi.org/10.1063/1.4915613
Improving the dielectric properties of an electrowetting-on-dielectric microfluidic device with a low-pressure chemical vapor deposited Si3N4 dielectric layer.
P356
Q35224917-D939E432-68D8-4A86-ACEB-52DE1428E275
P356
1.4915613
http://dx.doi.org/10.1063/1.4915613