Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
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Amorphous-crystalline phase transition during the growth of thin films: The case of microcrystalline siliconIntrinsic stress in sputter-deposited thin filmsA Sputtered Silicon Oxide Electrolyte for High-Performance Thin-Film Transistors.Great enhancements in the thermoelectric power factor of BiSbTe nanostructured films with well-ordered interfaces.Anisotropic imprint of amorphization and phase separation in manganite thin films via laser interference irradiation.Large area and broadband ultra-black absorber using microstructured aluminum doped silicon films.Intrinsic Resistance Switching in Amorphous Silicon Suboxides: The Role of Columnar Microstructure.Nanotwinned metal MEMS films with unprecedented strength and stability.Thin Film Deposition Using Energetic Ions.Chemical etching of zinc oxide for thin-film silicon solar cells.Molecular dynamics studies of defect formation during heteroepitaxial growth of InGaN alloys on (0001) GaN surfaces.A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines.Suppression of Aluminum Current Collector Dissolution by Protective Ceramic Coatings for Better High-Voltage Battery Performance.The Impact of Grain Alignment of the Electron Transporting Layer on the Performance of Inverted Bulk Heterojunction Solar Cells.One-step growth of well-aligned TiO2 nanorod arrays for flexible dye-sensitized solar cells.Dynamic roughening of tetrahedral amorphous carbon.A calorimetric probe for plasma diagnostics.Influence of rf magnetron sputtering conditions on the magnetic, crystalline, and electrical properties of thin nickel filmsSynthesis of open-cell metal foams by templated directed vapor depositionElectrical and optical properties of sputtered amorphous vanadium oxide thin filmsBeryllium deposition on International Thermonuclear Experimental Reactor first mirrors: Layer morphology and influence on mirror reflectivityRoom temperature-processed inverted organic solar cells using high working-pressure-sputtered ZnO filmsThermal conductivity of yttria-stabilized zirconia thin films with a zigzag microstructureGrowth of the [110] Oriented TiO2 Nanorods on ITO Substrates by Sputtering Technique for Dye-Sensitized Solar CellsArchitecture of Thin Solid Films by the GLAD TechniqueMETAL-TO-DIELECTRIC TRANSITION INDUCED BY ANNEALING OF ORIENTED TITANIUM THIN FILMSPhotocatalytic Activity of Nanostructured Titanium Dioxide Thin FilmsWettability and surface forces measured by atomic force microscopy: the role of roughnessDiffusion barrier properties of molybdenum back contacts for Cu(In,Ga)Se2 solar cells on stainless steel foilsMagnetron Sputtering a New Fabrication Method of Iron Based Biodegradable Implant MaterialsNanocrystalline Porous Hydrogen Storage Based on Vanadium and Titanium Nitrides
P2860
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P2860
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
description
1974 nî lūn-bûn
@nan
1974 թուականի Յուլիսին հրատարակուած գիտական յօդուած
@hyw
1974 թվականի հուլիսին հրատարակված գիտական հոդված
@hy
1974年の論文
@ja
1974年論文
@yue
1974年論文
@zh-hant
1974年論文
@zh-hk
1974年論文
@zh-mo
1974年論文
@zh-tw
1974年论文
@wuu
name
Influence of apparatus geometr ...... hy of thick sputtered coatings
@ast
Influence of apparatus geometr ...... hy of thick sputtered coatings
@en
type
label
Influence of apparatus geometr ...... hy of thick sputtered coatings
@ast
Influence of apparatus geometr ...... hy of thick sputtered coatings
@en
prefLabel
Influence of apparatus geometr ...... hy of thick sputtered coatings
@ast
Influence of apparatus geometr ...... hy of thick sputtered coatings
@en
P356
P1476
Influence of apparatus geometr ...... hy of thick sputtered coatings
@en
P2093
John A. Thornton
P304
P356
10.1116/1.1312732
P577
1974-07-01T00:00:00Z