PHOTOLITHOGRAPHY-FREE LASER-PATTERNED HF ACID-RESISTANT CHROMIUM-POLYIMIDE MASK FOR RAPID FABRICATION OF MICROFLUIDIC SYSTEMS IN GLASS.
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PHOTOLITHOGRAPHY-FREE LASER-PATTERNED HF ACID-RESISTANT CHROMIUM-POLYIMIDE MASK FOR RAPID FABRICATION OF MICROFLUIDIC SYSTEMS IN GLASS.
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2016 nî lūn-bûn
@nan
2016年の論文
@ja
2016年学术文章
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2016年学术文章
@zh-cn
2016年学术文章
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2016年学术文章
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2016年学术文章
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2016年學術文章
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2016年學術文章
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2016年學術文章
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name
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@ast
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@en
type
label
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@ast
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@en
prefLabel
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@ast
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@en
P2093
P2860
P356
P1476
PHOTOLITHOGRAPHY-FREE LASER-PA ...... MICROFLUIDIC SYSTEMS IN GLASS.
@en
P2093
Cristina E Davis
Konstantin O Zamuruyev
Yuriy Zrodnikov
P2860
P356
10.1088/0960-1317/27/1/015010
P577
2016-10-28T00:00:00Z