Tantalum nitride films integrated with transparent conductive oxide substrates via atomic layer deposition for photoelectrochemical water splitting.
about
Tantalum nitride films integrated with transparent conductive oxide substrates via atomic layer deposition for photoelectrochemical water splitting.
description
article científic
@ca
article scientifique
@fr
articolo scientifico
@it
artigo científico
@pt
bilimsel makale
@tr
scientific article published on 05 July 2016
@en
vedecký článok
@sk
vetenskaplig artikel
@sv
videnskabelig artikel
@da
vědecký článek
@cs
name
Tantalum nitride films integra ...... ectrochemical water splitting.
@en
Tantalum nitride films integra ...... ectrochemical water splitting.
@nl
type
label
Tantalum nitride films integra ...... ectrochemical water splitting.
@en
Tantalum nitride films integra ...... ectrochemical water splitting.
@nl
prefLabel
Tantalum nitride films integra ...... ectrochemical water splitting.
@en
Tantalum nitride films integra ...... ectrochemical water splitting.
@nl
P2860
P356
P1433
P1476
Tantalum nitride films integra ...... ectrochemical water splitting.
@en
P2093
Omid Zandi
Thomas W Hamann
P2860
P304
P356
10.1039/C6SC02116F
P577
2016-07-05T00:00:00Z