Controlling order in block copolymer thin films for nanopatterning applications.
about
Patterning methods for polymers in cell and tissue engineeringGiant surfactants provide a versatile platform for sub-10-nm nanostructure engineeringDesign and application of inorganic nanoparticle superstructures: current status and future challenges.Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter.Nanolithography: Painting with block copolymers.Smectic block copolymer thin films on corrugated substrates.Pattern transfer using block copolymers.Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio.Stability and orientation of lamellae in diblock copolymer films.Self-assembly of colloidal micelles in microfluidic channels.Patterning at the 10 nanometer length scale using a strongly segregating block copolymer thin film and vapor phase infiltration of inorganic precursors.Thermally-induced transition of lamellae orientation in block-copolymer films on 'neutral' nanoparticle-coated substrates.Kinetics of lamellar formation on sparsely stripped patterns.Large scale simulation of block copolymers with cell dynamicsNanostructured Colloidal Particles by Confined Self-Assembly of Block Copolymers in Evaporative Droplets
P2860
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P2860
Controlling order in block copolymer thin films for nanopatterning applications.
description
article científic
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article scientifique
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articol științific
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articolo scientifico
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artigo científico
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artigo científico
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artigo científico
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artikel ilmiah
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artikull shkencor
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artículo científico
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name
Controlling order in block copolymer thin films for nanopatterning applications.
@en
Controlling order in block copolymer thin films for nanopatterning applications.
@nl
type
label
Controlling order in block copolymer thin films for nanopatterning applications.
@en
Controlling order in block copolymer thin films for nanopatterning applications.
@nl
prefLabel
Controlling order in block copolymer thin films for nanopatterning applications.
@en
Controlling order in block copolymer thin films for nanopatterning applications.
@nl
P1476
Controlling order in block copolymer thin films for nanopatterning applications.
@en
P2093
Andrew P Marencic
Richard A Register
P304
P356
10.1146/ANNUREV-CHEMBIOENG-073009-101007
P577
2010-01-01T00:00:00Z