Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
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Atomic-resolved depth profile of strain and cation intermixing around LaAlO3/SrTiO3 interfacesSurface Termination Conversion during SrTiO3 Thin Film Growth Revealed by X-ray Photoelectron Spectroscopy.Disentanglement of growth dynamic and thermodynamic effects in LaAlO3/SrTiO3 heterostructures.Strain induced atomic structure at the Ir-doped LaAlO3/SrTiO3 interface.
P2860
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
description
2015 nî lūn-bûn
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2015年の論文
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2015年論文
@yue
2015年論文
@zh-hant
2015年論文
@zh-hk
2015年論文
@zh-mo
2015年論文
@zh-tw
2015年论文
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2015年论文
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2015年论文
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name
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
@en
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
@nl
type
label
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
@en
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
@nl
prefLabel
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
@en
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers.
@nl
P2093
P2860
P50
P356
P1433
P1476
Transport limits in defect-engineered LaAlO3/SrTiO3 bilayers
@en
P2093
Guus Rijnders
Paul Meuffels
Sebastian Wicklein
P2860
P304
P356
10.1039/C4NR06272H
P407
P577
2015-01-01T00:00:00Z