Electroosmotic flow in vapor deposited silicon dioxide and nitride microchannels.
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From understanding cellular function to novel drug discovery: the role of planar patch-clamp array chip technologyCharacterization of nanochannel delivery membrane systems for the sustained release of resveratrol and atorvastatin: new perspectives on promoting heart health.Selective trapping and concentration of nanoparticles and viruses in dual-height nanofluidic channels.
P2860
Electroosmotic flow in vapor deposited silicon dioxide and nitride microchannels.
description
2007 nî lūn-bûn
@nan
2007年の論文
@ja
2007年論文
@yue
2007年論文
@zh-hant
2007年論文
@zh-hk
2007年論文
@zh-mo
2007年論文
@zh-tw
2007年论文
@wuu
2007年论文
@zh
2007年论文
@zh-cn
name
Electroosmotic flow in vapor deposited silicon dioxide and nitride microchannels.
@en
type
label
Electroosmotic flow in vapor deposited silicon dioxide and nitride microchannels.
@en
prefLabel
Electroosmotic flow in vapor deposited silicon dioxide and nitride microchannels.
@en
P2093
P2860
P356
P1433
P1476
Electroosmotic flow in vapor deposited silicon dioxide and nitride microchannels.
@en
P2093
Aaron R Hawkins
Adam T Woolley
John M Edwards
Mark N Hamblin
Milton L Lee
P2860
P356
10.1063/1.2752376
P577
2007-07-09T00:00:00Z