Direct electrodeposition of crystalline silicon at low temperatures.
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Emerging applications of liquid metals featuring surface oxides.Electrodeposition of germanium at elevated temperatures and pressures from ionic liquids.Liquid gallium and the eutectic gallium indium (EGaIn) alloy: Dielectric functions from 1.24 to 3.1 eV by electrochemical reduction of surface oxides
P2860
Direct electrodeposition of crystalline silicon at low temperatures.
description
2013 nî lūn-bûn
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2013年学术文章
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Direct electrodeposition of crystalline silicon at low temperatures.
@en
Direct electrodeposition of crystalline silicon at low temperatures.
@nl
type
label
Direct electrodeposition of crystalline silicon at low temperatures.
@en
Direct electrodeposition of crystalline silicon at low temperatures.
@nl
prefLabel
Direct electrodeposition of crystalline silicon at low temperatures.
@en
Direct electrodeposition of crystalline silicon at low temperatures.
@nl
P2093
P356
P1476
Direct electrodeposition of crystalline silicon at low temperatures.
@en
P2093
Eli Fahrenkrug
Stephen Maldonado
P304
P356
10.1021/JA310897R
P407
P577
2013-01-24T00:00:00Z