Periodic trends in organic functionalization of group IV semiconductor surfaces.
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From the bottom up: dimensional control and characterization in molecular monolayers.Ethoxy and silsesquioxane derivatives of antimony as dopant precursors: unravelling the structure and thermal stability of surface species on SiO2.Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study.Simple, robust molecular self-assembly on germanium
P2860
Periodic trends in organic functionalization of group IV semiconductor surfaces.
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2010 nî lūn-bûn
@nan
2010年の論文
@ja
2010年学术文章
@wuu
2010年学术文章
@zh-cn
2010年学术文章
@zh-hans
2010年学术文章
@zh-my
2010年学术文章
@zh-sg
2010年學術文章
@yue
2010年學術文章
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2010年學術文章
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name
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@en
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@nl
type
label
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@en
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@nl
prefLabel
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@en
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@nl
P2093
P356
P1476
Periodic trends in organic functionalization of group IV semiconductor surfaces.
@en
P2093
Jessica S Kachian
Keith T Wong
Stacey F Bent
P304
P356
10.1021/AR900251S
P407
P577
2010-02-01T00:00:00Z