Tungsten allylimido complexes Cl4(RCN)W(NC3H5) as single-source CVD precursors for WNxCy thin films. Correlation of precursor fragmentation to film properties.
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Novel aspects of the transamination reaction between Ti(NMe2)4 and primary amines.Novel β-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for solution based processing of ZrO2 thin films.MOCVD of TiO2Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical PropertiesMOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
P2860
Tungsten allylimido complexes Cl4(RCN)W(NC3H5) as single-source CVD precursors for WNxCy thin films. Correlation of precursor fragmentation to film properties.
description
2005 nî lūn-bûn
@nan
2005年の論文
@ja
2005年学术文章
@wuu
2005年学术文章
@zh
2005年学术文章
@zh-cn
2005年学术文章
@zh-hans
2005年学术文章
@zh-my
2005年学术文章
@zh-sg
2005年學術文章
@yue
2005年學術文章
@zh-hant
name
Tungsten allylimido complexes Cl4
@nl
Tungsten allylimido complexes ...... gmentation to film properties.
@en
type
label
Tungsten allylimido complexes Cl4
@nl
Tungsten allylimido complexes ...... gmentation to film properties.
@en
prefLabel
Tungsten allylimido complexes Cl4
@nl
Tungsten allylimido complexes ...... gmentation to film properties.
@en
P2093
P356
P1476
Tungsten allylimido complexes ...... agmentation to film properties
@en
P2093
Benjamin C Brooks
David H Powell
Elizabeth A Zapp
Hiral M Ajmera
Kelly M Green
Khalil A Abboud
Laurel L Reitfort
Omar J Bchir
Timothy J Anderson
P304
P356
10.1021/JA043799D
P407
P577
2005-06-01T00:00:00Z