Atomic force microscopy and nanoindentation investigation of polydimethylsiloxane elastomeric substrate compliancy for various sputtered thin film morphologies.
about
Atomic force microscopy and nanoindentation investigation of polydimethylsiloxane elastomeric substrate compliancy for various sputtered thin film morphologies.
description
2017 nî lūn-bûn
@nan
2017年の論文
@ja
2017年学术文章
@wuu
2017年学术文章
@zh
2017年学术文章
@zh-cn
2017年学术文章
@zh-hans
2017年学术文章
@zh-my
2017年学术文章
@zh-sg
2017年學術文章
@yue
2017年學術文章
@zh-hant
name
Atomic force microscopy and na ...... ttered thin film morphologies.
@en
Atomic force microscopy and na ...... ttered thin film morphologies.
@nl
type
label
Atomic force microscopy and na ...... ttered thin film morphologies.
@en
Atomic force microscopy and na ...... ttered thin film morphologies.
@nl
prefLabel
Atomic force microscopy and na ...... ttered thin film morphologies.
@en
Atomic force microscopy and na ...... ttered thin film morphologies.
@nl
P2860
P356
P1476
Atomic force microscopy and na ...... uttered thin film morphologies
@en
P2093
Soumen Das
P2860
P304
P356
10.1002/JBM.A.36283
P577
2017-11-16T00:00:00Z