Using deposition rate to increase the thermal and kinetic stability of vapor-deposited hole transport layer glasses via a simple sublimation apparatus.
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Using deposition rate to increase the thermal and kinetic stability of vapor-deposited hole transport layer glasses via a simple sublimation apparatus.
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2017 nî lūn-bûn
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2017年の論文
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2017年学术文章
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2017年学术文章
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2017年學術文章
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name
Using deposition rate to incre ...... simple sublimation apparatus.
@en
Using deposition rate to incre ...... simple sublimation apparatus.
@nl
type
label
Using deposition rate to incre ...... simple sublimation apparatus.
@en
Using deposition rate to incre ...... simple sublimation apparatus.
@nl
prefLabel
Using deposition rate to incre ...... simple sublimation apparatus.
@en
Using deposition rate to incre ...... simple sublimation apparatus.
@nl
P2860
P356
P1476
Using deposition rate to incre ...... simple sublimation apparatus.
@en
P2093
Kenneth L Kearns
Paige Krzyskowski
P2860
P304
P356
10.1063/1.4979814
P407
P577
2017-05-01T00:00:00Z