Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes.
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Silicon Photoanodes Partially Covered by Ni@Ni(OH)2 Core-Shell Particles for Photoelectrochemical Water Oxidation.Dielectric Breakdown and Post-Breakdown Dissolution of Si/SiO2 Cathodes in Acidic Aqueous Electrochemical Environment.Crystalline TiO protective layer with graded oxygen defects for efficient and stable silicon-based photocathode
P2860
Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes.
description
2016 nî lūn-bûn
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2016年の論文
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2016年学术文章
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2016年学术文章
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2016年学术文章
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name
Localized dielectric breakdown ...... semiconductor photoelectrodes.
@en
Localized dielectric breakdown ...... semiconductor photoelectrodes.
@nl
type
label
Localized dielectric breakdown ...... semiconductor photoelectrodes.
@en
Localized dielectric breakdown ...... semiconductor photoelectrodes.
@nl
prefLabel
Localized dielectric breakdown ...... semiconductor photoelectrodes.
@en
Localized dielectric breakdown ...... semiconductor photoelectrodes.
@nl
P2093
P2860
P356
P1433
P1476
Localized dielectric breakdown ...... -semiconductor photoelectrodes
@en
P2093
P2860
P2888
P304
P356
10.1038/NMAT4801
P407
P577
2016-11-07T00:00:00Z