Physical Continuity and Vertical Alignment of Block Copolymer Domains by Kinetically Controlled Electrospray Deposition.

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Physical Continuity and Vertical Alignment of Block Copolymer Domains by Kinetically Controlled Electrospray Deposition.

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2015 nî lūn-bûn

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2015年の論文

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2015年学术文章

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2015年学术文章

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2015年学术文章

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2015年学术文章

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2015年学术文章

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2015年学术文章

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2015年學術文章

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2015年學術文章

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Physical Continuity and Vertic ...... olled Electrospray Deposition.

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Physical Continuity and Vertic ...... olled Electrospray Deposition.

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label

Physical Continuity and Vertic ...... olled Electrospray Deposition.

@en

Physical Continuity and Vertic ...... olled Electrospray Deposition.

@nl

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Physical Continuity and Vertic ...... olled Electrospray Deposition.

@en

Physical Continuity and Vertic ...... olled Electrospray Deposition.

@nl

P1476

Physical Continuity and Vertic ...... olled Electrospray Deposition.

@en

P2093

Hanqiong Hu

http://www.w3.org/2001/XMLSchema#string

Xunda Feng

http://www.w3.org/2001/XMLSchema#string

Youngwoo Choo

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P2860

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter.

Continuous equilibrated growth of ordered block copolymer thin films by electrospray deposition.

Evolution of block copolymer lithography to highly ordered square arrays.

Highly aligned ultrahigh density arrays of conducting polymer nanorods using block copolymer templates.

Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays.

Membranes with highly ordered straight nanopores by selective swelling of fast perpendicularly aligned block copolymers.

Tuning Structure and Properties of Graded Triblock Terpolymer-Based Mesoporous and Hybrid Films

Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope

Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials

P304

1290-1296

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P31

scholarly article

P356

10.1002/MARC.201500099

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P433

http://www.w3.org/2001/XMLSchema#string

P478

http://www.w3.org/2001/XMLSchema#string

P50

Chinedum O. Osuji

P577

2015-05-08T00:00:00Z

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P698

25959572

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