Polysulfobetaine-based diblock copolymer nano-objects via polymerization-induced self-assembly
about
Photoinitiated Polymerization-Induced Self-Assembly (Photo-PISA): New Insights and Opportunities.Comparison of photo- and thermally initiated polymerization-induced self-assembly: a lack of end group fidelity drives the formation of higher order morphologies.One-Pot Synthesis of Double Poly(Ionic Liquid) Block Copolymers by Cobalt-Mediated Radical Polymerization-Induced Self-Assembly (CMR-PISA) in Water.
P2860
Polysulfobetaine-based diblock copolymer nano-objects via polymerization-induced self-assembly
description
im Januar 2015 veröffentlichter wissenschaftlicher Artikel
@de
wetenschappelijk artikel
@nl
наукова стаття, опублікована у 2015
@uk
name
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en-gb
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@nl
type
label
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en-gb
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@nl
prefLabel
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en-gb
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@nl
P2860
P356
P1154
2-s2.0-84944035724
P1433
P1476
Polysulfobetaine-based diblock ...... rization-induced self-assembly
@en
P2093
Kay E. B. Doncom
P2860
P304
P356
10.1039/C5PY00396B
P577
2015-01-01T00:00:00Z