Electron beam lithography—Resolution limits

Electron beam lithography—Resolution limits

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http://www.wikidata.org/entity/Q55953450
A theoretical analysis of the feasibility of a singularity-induced micro-electroporation systemNano-artifact metrics based on random collapse of resistDigital in-line holography on amplitude and phase objects prepared with electron beam lithography.Atomic-Level Sculpting of Crystalline Oxides: Toward Bulk Nanofabrication with Single Atomic Plane Precision.Magnetic Nanoparticles: Material Engineering and Emerging Applications in Lithography and Biomedicine.Novel Self-shrinking Mask for Sub-3 nm Pattern FabricationPhotochemically Driven Polymeric Network Formation: Synthesis and Applications.IonCCD detector for miniature sector-field mass spectrometer: investigation of peak shape and detector surface artifacts induced by keV ion detection.Surface Patterning of Functional Ceramics: A Materials Design
P2860

Electron beam lithography—Resolution limits

Item
http://www.wikidata.org/entity/Q55953450
description
article
@en
wetenschappelijk artikel
@nl
наукова стаття, опублікована у вересні 1996
@uk
ലേഖനം
@ml
name
Electron beam lithography—Resolution limits
@en
Electron beam lithography—Resolution limits
@nl
type
label
Electron beam lithography—Resolution limits
@en
Electron beam lithography—Resolution limits
@nl
prefLabel
Electron beam lithography—Resolution limits
@en
Electron beam lithography—Resolution limits
@nl
P1433
P1476
P2093
P304
P31
P356
P433
P478
P577
P356
P1433
P1476
Electron beam lithography—Resolution limits
@en
P2093
P304
P31
P356
10.1016/0167-9317(95)00368-1
P433
P478
P577