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Resonant Interferometric Lithography beyond the Diffraction LimitCreation of maximally entangled photon-number states using optical fiber multiports“Two-Photon” Coincidence Imaging with a Classical SourceQuantum Lithography beyond the Diffraction Limit via Rabi OscillationsTime-Reversal and Super-Resolving Phase MeasurementsPhotonic quantum information: science and technologyFlexible Two-Photon Interference Fringes with Thermal LightHigh visibility first-order subwavelength interference based on light pulse storage via electromagnetically induced transparencyAn entanglement-enhanced microscope.Characterization of two distant double-slits by chaotic light second-order interference.Active control on high-order coherence and statistic characterization on random phase fluctuation of two classical point sources.Fast and simple scheme for generating NOON states of photons in circuit QED.Super sub-wavelength patterns in photon coincidence detection.The X-like shaped spatiotemporal structure of the biphoton entangled state in a cold two-level atomic ensemble.Sequential Path Entanglement for Quantum Metrology.Young's double-slit interference with two-color biphotons.Generation of photonic entanglement in green fluorescent proteins.Fast-forwarding of Hamiltonians and exponentially precise measurements.Deterministic Down-Converter and Continuous Photon-Pair Source within the Bad-Cavity Limit.Quantum lithography with classical light.On-chip steering of entangled photons in nonlinear photonic crystals.Fourier-Transform Ghost Imaging with Hard X Rays.Ghost imaging with incoherent and partially coherent light radiation.High-NOON states by mixing quantum and classical light.Quantum and Classical Coincidence ImagingQuantum lithography: status of the fieldDemonstration of interferometric atom-pattern engineering via Rabi oscillationsOptimum Mixed-State Discrimination for Noisy Entanglement-Enhanced SensingHigh-dimensional quantum nature of ghost angular Young’s diffractionDual-path source engineering in integrated quantum opticsQuantum Sensors: Improved Optical Measurement via Specialized Quantum States
P2860
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P2860
description
article publié dans la revue scientifique Physical Review Letters
@fr
im Juni 2001 veröffentlichter wissenschaftlicher Artikel
@de
scientific article published in Physical Review Letters
@en
wetenschappelijk artikel
@nl
наукова стаття, опублікована в червні 2001
@uk
name
Two-Photon Diffraction and Quantum Lithography
@en
Two-Photon Diffraction and Quantum Lithography
@nl
type
label
Two-Photon Diffraction and Quantum Lithography
@en
Two-Photon Diffraction and Quantum Lithography
@nl
prefLabel
Two-Photon Diffraction and Quantum Lithography
@en
Two-Photon Diffraction and Quantum Lithography
@nl
P2860
P1476
Two-photon diffraction and quantum lithography
@en
P2093
P2860
P304
P356
10.1103/PHYSREVLETT.87.013602
P407
P577
2001-06-14T00:00:00Z
P698
P818
quant-ph/0103035