Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
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Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
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im Juni 2005 veröffentlichter wissenschaftlicher Artikel
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wetenschappelijk artikel
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наукова стаття, опублікована в червні 2005
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Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
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Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
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Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
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Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
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Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
@en
Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
@nl
P2093
P50
P356
P1476
Boron passivation and its reactivation in mesoporous silicon: a “chemical” model
@en
P2093
E. Garrone
E. Giamello
G. P. Salvador
L. Boarino
L. Pallavidino
R. Gobetto
P304
P356
10.1002/PSSA.200461184
P577
2005-06-01T00:00:00Z