Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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im Januar 2018 veröffentlichter wissenschaftlicher Artikel

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wetenschappelijk artikel

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наукова стаття, опублікована у 2018

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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P1476

Chemical vapor growth and delamination of α-RuCl3 nanosheets down to the monolayer limit

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P2093

Martin Grönke

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Martin Valldor

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Peer Schmidt

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Silke Hampel

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Steffen Oswald

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19014-19022

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P31

scholarly article

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10.1039/C8NR04667K

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P407

English

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P478

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Bernd Büchner

Daniel Wolf

Axel Lubk

P577

2018-01-01T00:00:00Z

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