Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning
about
Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning
description
scientific article published on 20 November 2014
@en
name
Polymer-confined colloidal mon ...... pid wafer-scale nanopatterning
@en
type
label
Polymer-confined colloidal mon ...... pid wafer-scale nanopatterning
@en
prefLabel
Polymer-confined colloidal mon ...... pid wafer-scale nanopatterning
@en
P2093
P50
P356
P1476
Polymer-confined colloidal mon ...... pid wafer-scale nanopatterning
@en
P2093
Chun-Yuen Wong
Ho-Yuen Cheung
Lifan Shen
P304
20837-20841
P356
10.1021/AM505221G
P577
2014-11-20T00:00:00Z