Reliable metal deposition into TiO(2) nanotubes for leakage-free interdigitated electrode structures and use as a memristive electrode.
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Electrochemical Tantalum Oxide for Resistive Switching Memories.Mesoporous inorganic salts with crystal defects: unusual catalysts and catalyst supports.Hierarchical MoS2 Nanosheet@TiO2 Nanotube Array Composites with Enhanced Photocatalytic and Photocurrent Performances.Controlled growth of polythiophene nanofibers in TiO2 nanotube arrays for supercapacitor applications
P2860
Reliable metal deposition into TiO(2) nanotubes for leakage-free interdigitated electrode structures and use as a memristive electrode.
description
2013 nî lūn-bûn
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name
Reliable metal deposition into TiO
@nl
Reliable metal deposition into ...... use as a memristive electrode.
@en
type
label
Reliable metal deposition into TiO
@nl
Reliable metal deposition into ...... use as a memristive electrode.
@en
prefLabel
Reliable metal deposition into TiO
@nl
Reliable metal deposition into ...... use as a memristive electrode.
@en
P2860
P356
P1476
Reliable metal deposition into ...... use as a memristive electrode.
@en
P2093
Patrik Schmuki
P2860
P304
12381-12384
P356
10.1002/ANIE.201306334
P407
P577
2013-10-02T00:00:00Z