Centifugually formed film growth
Centifugually formed film growth is a process used to form thin layers of materials by using a centrifuge. It is used commercially to make thin layers of silicon for use in solar cells. When used for forming thin layers of silicon, the centrifuge runs at a temperature of approximately 1,400 °C.
Wikipage redirect
primaryTopic
Centifugually formed film growth
Centifugually formed film growth is a process used to form thin layers of materials by using a centrifuge. It is used commercially to make thin layers of silicon for use in solar cells. When used for forming thin layers of silicon, the centrifuge runs at a temperature of approximately 1,400 °C.
has abstract
Centifugually formed film grow ...... ure of approximately 1,400 °C.
@en
Wikipage page ID
Wikipage revision ID
601,699,700
subject
hypernym
type
comment
Centifugually formed film grow ...... ure of approximately 1,400 °C.
@en
label
Centifugually formed film growth
@en