Electron beam-induced deposition
Electron beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope, which results in high spatial accuracy (potentially below one nanometer) and the possibility to produce free-standing, three-dimensional structures.
primaryTopic
Electron beam-induced deposition
Electron beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope, which results in high spatial accuracy (potentially below one nanometer) and the possibility to produce free-standing, three-dimensional structures.
has abstract
Deposição induzida por feixe d ...... tridimensionais independentes.
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Electron beam-induced depositi ...... three-dimensional structures.
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La croissance assistée par fai ...... structures tridimensionnelles.
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Deposição induzida por feixe d ...... tridimensionais independentes.
@pt
Electron beam-induced depositi ...... three-dimensional structures.
@en
La croissance assistée par fai ...... structures tridimensionnelles.
@fr
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Deposição induzida por feixe de elétrons
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Electron beam-induced deposition
@en
Electron beam-induced deposition
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