Magnetolithography (ML) is a method for pattern surfaces. ML based on applying a magnetic field on the substrate using paramagnetic metal masks named "magnetic mask". Magnetic masks are analogous to a photomask in photolithography, in that they define the spatial distribution and shape of the applied magnetic field. The second component of the process is ferromagnetic nanoparticles (analogous to the photoresist in photolithography) that are assembled onto the substrate according to the field induced by the magnetic mask.