about
Q13218505-95D195F5-33C6-4171-824C-E6705352F11CQ27921668-0F554D73-C048-48F7-A1A4-E6F2023A36DAQ294755-90F32A9D-8B3D-4C42-8ADC-F4EF956A7124Q4047934-34BD0A05-8E3F-4D45-B694-566CC6601E76Q4047935-34F24F02-9B57-47BD-AAD8-643F7C927FCBQ4047936-4F142692-6DD0-4B86-929D-F94C34B567EBQ4047939-C0E72AFE-DD8B-4197-A9F3-0E9472F520E0Q4047940-68EB95F9-9654-4F5F-AD0B-97C167C36C22Q4047941-0F71E1F2-2DA0-4597-A3DE-81DB8F169B64Q4489474-9A3A12BD-469C-4537-A5A0-A0912EDC89ADQ56516909-FF9774B2-A7DD-4899-823D-BBCCB791F91EQ90327087-E3CBF9A0-4098-479A-AB53-C752832F6E94Q90409761-3C059BEA-7C32-418B-A793-C5C13EFEF036Q90409767-14F609B7-63A3-40E2-9C4D-E20F5170B3ADQ90409769-A6936635-A22C-4632-B86B-2FF972D34A50Q90540251-60A70110-423A-4894-B160-0E43DDB728BFQ90540256-E2CDAB77-77AB-4BAE-9C3A-AC6E4814FF09Q90540261-D0FC9EEB-30B0-41EE-97B6-6259A00F8222
P2079
description
semiconductor manufacturing processes with a 40 nm MOSFET technology half-node
@en
name
40 nm lithography process
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40 нанометров
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type
label
40 nm lithography process
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40 нанометров
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altLabel
40 nanometer
@en
40 nanometre
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40 nm
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40nm
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prefLabel
40 nm lithography process
@en
40 нанометров
@ru