Journal of vacuum science and technology. B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena : JVST B - Wikidata - wikimedia - TriplyDB

Journal of vacuum science and technology. B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena : JVST B

Journal of vacuum science and technology. B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena : JVST B

http://www.wikidata.org/entity/Q27724301

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Visualizing contact line phenomena on microstructured superhydrophobic surfaces Integrated processing of contrast pulse sequencing ultrasound imaging for enhanced active contrast of hollow gas filled silica nanoshells and microshells.Direct thermal-UV nanoimprint of an iron-containing organometallic hybrid film Nanostructured silicon membranes for control of molecular transport.Optically anisotropic infinite cylinder above an optically anisotropic half space: Dispersion interaction of a single-walled carbon nanotube with a substrate Clinical probe utilizing surface enhanced Raman scattering Structural and magnetic characterization of superparamagnetic iron platinum nanoparticle contrast agents for magnetic resonance imaging.Direct patterning of coplanar polyethylene glycol alkylsilane monolayers by deep-ultraviolet photolithography as a general method for high fidelity, long-term cell patterning and culture.Fabrication of Poly(ethylene glycol) Hydrogel Structures for Pharmaceutical Applications using Electron beam and Optical Lithography Progress toward an aberration-corrected low energy electron microscope for DNA sequencing and surface analysis Alkaline and ultrasonic dissolution of biological materials for trace silicon determination.Probing Albumin Adsorption onto Calcium Phosphates by XPS and ToF-SIMS Rapid serial prototyping of magnet-tipped attonewton-sensitivity cantilevers by focused ion beam manipulation Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions Improvement of polycrystalline silicon wafer solar cell efficiency by forming nanoscale pyramids on wafer surface using a self-mask etching technique X-ray tube with a graphite field emitter inflamed at high temperature.Uranium Ion Yields from Monodisperse Uranium Oxide Particles.Multi-technique Characterization of Adsorbed Peptide and Protein Orientation: LK310 and Protein G B1.Bifunctional nanoarrays for probing the immune response at the single-molecule level.Nanorough gold for enhanced Raman scattering.Arrays of topographically and peptide-functionalized hydrogels for analysis of biomimetic extracellular matrix properties.Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake.Lipid specific molecular ion emission as a function of the primary ion characteristics in TOF-SIMS.Optimized process for fabrication of free-standing silicon nanophotonic devices Automating tumor classification with pixel-by-pixel contrast-enhanced ultrasound perfusion kinetics.Review Article: Progress in fabrication of transition metal dichalcogenides heterostructure systems.Minimizing open-loop piezoactuator nonlinearity artifacts in atomic force microscope measurements.Time multiplexed deep reactive ion etching of germanium and silicon-A comparison of mechanisms and application to x-ray optics.Structural, magnetic, and nanoscale switching properties of BiFeO3 thin films grown by pulsed electron deposition Electrical detection of proteins and DNA using bioactivated microfluidic channels: Theoretical and experimental considerations.Interfacial reactions at Fe/topological insulator spin contacts.Creating nanoscale Ag patterns on the Si(111)–(√3 × √3)R30°-Ag surface via guided self-assembly Embedding a carbon nanotube across the diameter of a solid state nanopore Sub-100 nm integrated ferroelectric tunnel junction devices using hydrogen silsesquioxane planarization Enhanced photocathode performance through optimization of film thickness and substrate Extraction of the characteristics of current-limiting elements from field emission measurement data Fabrication of radiation hardened SOI with embedded Si nanocrystal by ion-cut technique Sub-10 nm plasma nanopatterning of InGaAs with nearly vertical and smooth sidewalls for advanced n-fin field effect transistors on silicon Assessment of nitrogen incorporation in dilute GaAsN films using isotopically enriched molecular beam epitaxy and resonant nuclear reaction analysis Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography

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Journal of vacuum science and technology. B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena : JVST B

http://www.wikidata.org/entity/Q27724301

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