Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures.
about
Magnetically driven three-dimensional manipulation and inductive heating of magnetic-dispersion containing metal alloys.Real-time monitoring of two-photon photopolymerization for use in fabrication of microfluidic devices.Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning.Soft-lithographic replication of 3D microstructures with closed loopsTwo-photon fabrication of organic solid-state distributed feedback lasers in rhodamine 6G doped SU-8
P2860
Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures.
description
1998 nî lūn-bûn
@nan
1998 թուականի Նոյեմբերին հրատարակուած գիտական յօդուած
@hyw
1998 թվականի նոյեմբերին հրատարակված գիտական հոդված
@hy
1998年の論文
@ja
1998年論文
@yue
1998年論文
@zh-hant
1998年論文
@zh-hk
1998年論文
@zh-mo
1998年論文
@zh-tw
1998年论文
@wuu
name
Single-shot two-photon exposur ...... three-dimensional structures.
@ast
Single-shot two-photon exposur ...... three-dimensional structures.
@en
Single-shot two-photon exposur ...... three-dimensional structures.
@nl
type
label
Single-shot two-photon exposur ...... three-dimensional structures.
@ast
Single-shot two-photon exposur ...... three-dimensional structures.
@en
Single-shot two-photon exposur ...... three-dimensional structures.
@nl
prefLabel
Single-shot two-photon exposur ...... three-dimensional structures.
@ast
Single-shot two-photon exposur ...... three-dimensional structures.
@en
Single-shot two-photon exposur ...... three-dimensional structures.
@nl
P2093
P356
P1433
P1476
Single-shot two-photon exposur ...... three-dimensional structures.
@en
P2093
Schwartz BJ
Witzgall G
Yablonovitch E
P304
P356
10.1364/OL.23.001745
P407
P577
1998-11-01T00:00:00Z