High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization.
about
Achieving λ/10 resolution CW STED nanoscopy with a Ti:Sapphire oscillatorFabrication and multifunction integration of microfluidic chips by femtosecond laser direct writing.Nanopillar array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system.Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size.3D Laser Micro- and Nano-Printing: Challenges for Chemistry.Photochemically Driven Polymeric Network Formation: Synthesis and Applications.Near-Field Optical Drilling of Sub-λ Pits in Thin Polymer Films.Streptavidin functionalized polymer nanodots fabricated by visible light lithography.Hybrid high-resolution three-dimensional nanofabrication for metamaterials and nanoplasmonics.Fabrication of gold micro/nanostructures by femtosecond laser direct writing and chemical etching3D Photonic Nanostructures via Diffusion-Assisted Direct fs Laser WritingBiofunctionalization of Sub-Diffractionally Patterned Polymer Structures by Photobleaching
P2860
Q28727922-C5DBDCE2-DCD0-4913-B554-636B0BA35CD4Q34620654-70449E17-2A8B-4D9F-95CF-26BD58C541CFQ34768704-EE369E4F-54CD-40D2-A003-B6379C39B642Q34778328-295D66A6-5F50-46A7-B7A4-D4BAF671553EQ36392526-3E2935F8-8DAA-4C04-B542-6CCC14A015EEQ38771966-DC226E12-8BD5-4AB7-9320-FFD24B637572Q41575673-ED661AAB-5632-4F28-8571-EE2D9EA82517Q42753450-CBB5F650-7BA3-4C57-AE29-0E9B07E06961Q45998493-DCA02908-110B-4DEC-A4C0-8D934DE787FBQ57379963-6E96FFFB-AAAC-4311-82F2-33BC307CFF05Q58698783-FF41A9E1-5C27-42E5-B7C8-6AA7A9142683Q58749351-35B7AB50-5C97-4C4C-A143-19B967C42489
P2860
High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization.
description
2011 nî lūn-bûn
@nan
2011 թուականի Սեպտեմբերին հրատարակուած գիտական յօդուած
@hyw
2011 թվականի սեպտեմբերին հրատարակված գիտական հոդված
@hy
2011年の論文
@ja
2011年論文
@yue
2011年論文
@zh-hant
2011年論文
@zh-hk
2011年論文
@zh-mo
2011年論文
@zh-tw
2011年论文
@wuu
name
High-photosensitive resin for ...... photoinhibited polymerization.
@ast
High-photosensitive resin for ...... photoinhibited polymerization.
@en
High-photosensitive resin for ...... photoinhibited polymerization.
@nl
type
label
High-photosensitive resin for ...... photoinhibited polymerization.
@ast
High-photosensitive resin for ...... photoinhibited polymerization.
@en
High-photosensitive resin for ...... photoinhibited polymerization.
@nl
prefLabel
High-photosensitive resin for ...... photoinhibited polymerization.
@ast
High-photosensitive resin for ...... photoinhibited polymerization.
@en
High-photosensitive resin for ...... photoinhibited polymerization.
@nl
P2093
P356
P1433
P1476
High-photosensitive resin for ...... photoinhibited polymerization
@en
P2093
P304
19486-19494
P356
10.1364/OE.19.019486
P407
P577
2011-09-01T00:00:00Z