In Situ Analysis of Oxygen Vacancies and Band Alignment in HfO2/TiN Structure for CMOS Applications.
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In Situ Analysis of Oxygen Vacancies and Band Alignment in HfO2/TiN Structure for CMOS Applications.
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2017 nî lūn-bûn
@nan
2017年の論文
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2017年論文
@yue
2017年論文
@zh-hant
2017年論文
@zh-hk
2017年論文
@zh-mo
2017年論文
@zh-tw
2017年论文
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2017年论文
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2017年论文
@zh-cn
name
In Situ Analysis of Oxygen Vac ...... ructure for CMOS Applications.
@en
type
label
In Situ Analysis of Oxygen Vac ...... ructure for CMOS Applications.
@en
prefLabel
In Situ Analysis of Oxygen Vac ...... ructure for CMOS Applications.
@en
P2093
P1476
In Situ Analysis of Oxygen Vac ...... ructure for CMOS Applications.
@en
P2093
Da-Peng Xu
David Wei Zhang
Hong-Liang Lu
Lin-Jie Yu
Qing-Qing Sun
Shi-Jin Ding
Xu-Dong Chen
P2888
P356
10.1186/S11671-017-2068-Y
P577
2017-04-27T00:00:00Z
P6179
1085072492