Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls.
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Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls.
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2015 nî lūn-bûn
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2015年の論文
@ja
2015年論文
@yue
2015年論文
@zh-hant
2015年論文
@zh-hk
2015年論文
@zh-mo
2015年論文
@zh-tw
2015年论文
@wuu
2015年论文
@zh
2015年论文
@zh-cn
name
Centimeter-scale subwavelength ...... sity at the oblique sidewalls.
@en
Centimeter-scale subwavelength ...... sity at the oblique sidewalls.
@nl
type
label
Centimeter-scale subwavelength ...... sity at the oblique sidewalls.
@en
Centimeter-scale subwavelength ...... sity at the oblique sidewalls.
@nl
prefLabel
Centimeter-scale subwavelength ...... sity at the oblique sidewalls.
@en
Centimeter-scale subwavelength ...... sity at the oblique sidewalls.
@nl
P2093
P50
P1433
P1476
Centimeter-scale subwavelength ...... nsity at the oblique sidewalls
@en
P2093
Binghua Zou
Danbi Tian
Fengwei Huo
Shuanglong Feng
Yayuan Liu
Yuanyuan Guo
P304
P356
10.1021/ACS.LANGMUIR.5B00568
P407
P577
2015-04-20T00:00:00Z