Uniform coating of Ta2O5 on vertically aligned substrate: A prelude to forced flow atomic layer deposition.

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Uniform coating of Ta2O5 on vertically aligned substrate: A prelude to forced flow atomic layer deposition.

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2017 nî lūn-bûn

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2017年の論文

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2017年学术文章

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2017年学术文章

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2017年学术文章

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2017年学术文章

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Uniform coating of Ta2O5 on ve ...... flow atomic layer deposition.

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Uniform coating of Ta2O5 on ve ...... flow atomic layer deposition.

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Uniform coating of Ta2O5 on ve ...... flow atomic layer deposition.

@en

Uniform coating of Ta2O5 on ve ...... flow atomic layer deposition.

@nl

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Uniform coating of Ta2O5 on ve ...... flow atomic layer deposition.

@en

Uniform coating of Ta2O5 on ve ...... flow atomic layer deposition.

@nl

P1476

Uniform coating of Ta2O5 on ve ...... d flow atomic layer deposition

@en

P2093

Chi-Chung Kei

http://www.w3.org/2001/XMLSchema#string

Wei-Szu Liu

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Yu-Hsuan Yu

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P2860

Tantalum-based semiconductors for solar water splitting.

Mechanisms of atomic layer deposition on substrates with ultrahigh aspect ratios.

Transparent ALD-grown Ta2O5 protective layer for highly stable ZnO photoelectrode in solar water splitting.

P304

065103

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P31

scholarly article

P356

10.1063/1.4983805

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P433

http://www.w3.org/2001/XMLSchema#string

P478

http://www.w3.org/2001/XMLSchema#string

P50

Mrinalini Mishra

Tsong-Pyng Perng

P577

2017-06-01T00:00:00Z

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P698

28668011

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