All-water-based electron-beam lithography using silk as a resist. - Wikidata - wikimedia - TriplyDB

All-water-based electron-beam lithography using silk as a resist.

All-water-based electron-beam lithography using silk as a resist.

http://www.wikidata.org/entity/Q50459021

about

Electrolithography--A New and Versatile Process for Nano Patterning.Aqueous multiphoton lithography with multifunctional silk-centred bio-resists Subsurface Super-resolution Imaging of Unstained Polymer Nanostructures Nanoscale probing of electron-regulated structural transitions in silk proteins by near-field IR imaging and nano-spectroscopy Orthotropic Piezoelectricity in 2D Nanocellulose Carbonization of a stable β-sheet-rich silk protein into a pseudographitic pyroprotein Protein-Based Three-Dimensional Whispering-Gallery-Mode Micro-Lasers with Stimulus-Responsiveness.Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography.Fabrication of polydimethylsiloxane (PDMS) nanofluidic chips with controllable channel size and spacing.Silk patterns made by direct femtosecond laser writing.Photo-induced structural modification of silk gels containing azobenzene side groups.Direct Write Protein Patterns for Multiplexed Cytokine Detection from Live Cells Using Electron Beam Lithography Silk Fibroin as Edible Coating for Perishable Food Preservation Generation of Localized Surface Plasmon Resonance Using Hybrid Au-Ag Nanoparticle Arrays as a Sensor of Polychlorinated Biphenyls Detection.Programming function into mechanical forms by directed assembly of silk bulk materials.Silk-Encapsulated Plasmonic Biochips with Enhanced Thermal Stability.Modulation of Multiscale 3D Lattices through Conformational Control: Painting Silk Inverse Opals with Water and Light.Fibrous proteins: At the crossroads of genetic engineering and biotechnological applications.Silk: Optical Properties over 12.6 Octaves THz-IR-Visible-UV Range.Towards scanning probe lithography-based 4D nanoprinting by advancing surface chemistry, nanopatterning strategies, and characterization protocols.Silk Fibroin for Flexible Electronic Devices.Exploring the Properties of Genetically Engineered Silk-Elastin-Like Protein Films.Effect of the Fabrication Parameters of the Nanosphere Lithography Method on the Properties of the Deposited Au-Ag Nanoparticle Arrays.Precise Protein Photolithography (P3): High Performance Biopatterning Using Silk Fibroin Light Chain as the Resist Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.Fabrication of Robust Protein Films Using Nanoimprint Lithography.Cell Assembly in Self-foldable Multi-layered Soft Micro-rolls.Origami lattices with free-form surface ornaments.Fabrication of carbon quantum dots with nano-defined position and pattern in one step via sugar-electron-beam writing.Deformable and conformal silk hydrogel inverse opal.Effect of Refractive Index of Substrate on Fabrication and Optical Properties of Hybrid Au-Ag Triangular Nanoparticle Arrays.Electron-beam lithography: going green with silk.Liquid Exfoliated Natural Silk Nanofibrils: Applications in Optical and Electrical Devices.2D Protein Supramolecular Nanofilm with Exceptionally Large Area and Emergent Functions.A microporous silk carbon-ionic liquid composite for the electrochemical sensing of dopamine.A fully biocompatible single-mode distributed feedback laser.Photocrosslinking of Silk Fibroin Using Riboflavin for Ocular Prostheses.Fabrication of Tunable, High-Refractive-Index Titanate-Silk Nanocomposites on the Micro- and Nanoscale.Silk-Based Aqueous Microcontact Printing.Fabrication of Silk Microstructures Using Photolithography

P2860

Q27304439-47300D8A-F451-403A-9E5A-7974B722594D Q27320876-36C120E8-BC7C-4A06-93EA-041FE872BDF0 Q27336646-C1965DE9-436F-4F6F-A48E-C25DD8C1DB94 Q28822198-75AF50D5-ACBD-4E66-9719-25FEFD7CE6AA Q28822443-92D4B2C0-ADFC-45F5-8774-3DD1E97A6881 Q30653084-F11479CA-033B-4EFD-8849-3BB78AB7FE99 Q30659864-DBFDAA7C-1A26-4453-B44D-55B9EA03B5F5 Q35546504-BE5DAD83-7603-45B8-9D7A-281F03B5B335 Q36107531-6BF76469-7591-4716-824E-19CD50DA9C27 Q36146607-AC97CC55-C375-4D95-ACBB-57A7D8D73EF9 Q36331574-8A40D392-14D6-487F-AA74-083090B1BE9F Q36510251-00E18DA0-DBA9-4D36-8C79-BE411B3DB90D Q36875374-2A7C283C-5C53-4A84-8623-907565053607 Q37244852-37E69171-4D33-481A-93D6-471FAEBA3D07 Q37599028-6C8ECDE3-317F-4F06-A820-7E9F6EF71181 Q37727883-E786A7D4-B30B-4C1C-A49F-90405E48D3C9 Q38398896-20258D96-EE70-4BD9-B6E4-E1B27872BD8E Q38579143-F1FD31C0-E70F-4FF1-BE70-C6EE265598D2 Q38643681-CBBDED70-4867-4494-8758-3C6703611155 Q38909052-DC412529-8FE4-47A1-8F14-54848B839A50 Q38930344-CB02D145-5D44-49E0-ABC4-A71902CF57BE Q38980831-3DB7E140-64FF-4E10-BA45-400628F0487B Q40992271-93E6D7EE-B7DB-4AD9-AC06-48A6AAD852E2 Q41710972-B52D0F03-B50A-4CA9-B52E-E27E741A9DE8 Q42365965-ABF2AE58-67D0-4C26-BD0D-748D826B2C3D Q42820693-F6B4CAE2-7443-4480-8C85-40EB452D56B6 Q47097776-DD42CDA6-42EA-44DE-8267-59D097D14BC6 Q47162239-0541DE69-0F71-4974-A6DF-5150F9056136 Q47810179-35A1B46D-4CB5-45EA-8A41-5D9661BD5D51 Q48060644-D26D3C94-3812-4F40-9A9C-B8A95A958B3C Q49820383-4017118F-9CC9-44E5-8E09-3168B2712907 Q50459022-9B391499-D2D3-4F99-AFD4-E90F598BF867 Q51276238-7C782ECF-9B22-4AAD-AA57-444B2B74A00F Q51281340-72EE0AC2-D8B6-4894-A26B-3EBCC40769F1 Q51442640-9D2F34B7-F7C8-4932-AA08-979ADCA9667D Q51504297-2706C63B-EC87-4FF0-8E6A-B1317119BA3C Q51543393-EEE2A3AC-72A8-4004-93B2-CF7BC531520D Q51704462-A6B45426-EEFB-48F7-95DA-50626DA4A6B7 Q55410383-DB3A0AD2-9F05-4308-B04A-DBABF561E66B Q57173417-C03280F0-4818-41AC-B7A7-0A1C004966B3

P2860

All-water-based electron-beam lithography using silk as a resist.

http://www.wikidata.org/entity/Q50459021

description

2014 nî lūn-bûn

@nan

2014年の論文

@ja

2014年学术文章

@wuu

2014年学术文章

@zh

2014年学术文章

@zh-cn

2014年学术文章

@zh-hans

2014年学术文章

@zh-my

2014年学术文章

@zh-sg

2014年學術文章

@yue

2014年學術文章

@zh-hant

name

All-water-based electron-beam lithography using silk as a resist.

@en

All-water-based electron-beam lithography using silk as a resist.

@nl

type

label

All-water-based electron-beam lithography using silk as a resist.

@en

All-water-based electron-beam lithography using silk as a resist.

@nl

prefLabel

All-water-based electron-beam lithography using silk as a resist.

@en

All-water-based electron-beam lithography using silk as a resist.

@nl

P1433

Q50459021-C9377C9D-600A-4909-9E5B-A7DEEB1745D1

P1476

Q50459021-348C54E6-6664-4887-A8B2-E2DF0AB5AEB1

P2093

Q50459021-2A164BD0-CDCA-4476-A4F9-169B9706671C

Q50459021-31661C9C-0820-4386-BE8B-D549C98EA989

Q50459021-95DC53BD-9081-4C71-B1A6-D6C85BDB2D19

Q50459021-C0B46112-98E2-4730-A01E-BE9B61A16077

Q50459021-E6658C66-A7C8-4A64-8BDD-B8AD5205ECCA

Q50459021-F4A09BB4-2D79-4523-BC59-A3CB17F28632

P2860

Q50459021-5F433282-2AE1-4553-B60C-B96D87D199F6

Q50459021-60445E94-C05C-4F0D-B6D2-28A7BF2ECCFA

Q50459021-72F3C327-F6D2-423A-ABB3-DAD22DA5B5B4

Q50459021-8B2D71F0-BF00-4CDA-871D-C88B5D6136BD

Q50459021-8EFBE270-F49C-4511-8C3C-ABF36ABDD447

Q50459021-93F19CF9-1213-47C3-8DA2-7DBC79D02E3B

Q50459021-A0161A82-7B90-4A58-8525-94E307E47F48

Q50459021-D33D10D7-354C-4F66-BFD6-24E236BB6092

Q50459021-D74C2E78-663E-463D-B37E-84F787561581

Q50459021-DA7C9DD1-AD08-43DD-A1FB-5EFA3A6BC226

P2888

Q50459021-A5C1A67D-43BB-44BA-922D-25EDF384EB26

P304

Q50459021-9ED316B2-623D-4553-98EF-8D9A69464C39

P31

Q50459021-0763448E-FC4F-419F-914B-E09C554068C5

P356

Q50459021-86B8F88A-F02A-4312-A7AA-9C09A593FA65

P407

Q50459021-8FB6BD00-1C49-40B3-964D-A0350107C6B4

P433

Q50459021-7B8E8861-6125-4293-A5C4-A6A45ACE9466

P478

Q50459021-241A671E-66EA-45AF-8F24-B20E3C1A60FF

P50

Q50459021-58F71982-5802-4C5D-8D75-7F22BA017072

Q50459021-5DC5E136-EBD0-4843-95D1-00C0E74C1DF8

Q50459021-98764621-FE9C-4723-A2E2-27ACA2EB17C0

P577

Q50459021-3716EDF8-55FD-4149-9AC6-617AB8EE14BC

P698

Q50459021-3C73205E-8035-41BB-900B-C7C80C8DF5E9

P356

P1433

Nature Nanotechnology

P1476

All-water-based electron-beam lithography using silk as a resist.

@en

P2093

Alexander N Mitropoulos

http://www.w3.org/2001/XMLSchema#string

Eun-Seok Gil

http://www.w3.org/2001/XMLSchema#string

Hu Tao

http://www.w3.org/2001/XMLSchema#string

Konstantinos Tsioris

http://www.w3.org/2001/XMLSchema#string

Mark A Brenckle

http://www.w3.org/2001/XMLSchema#string

Sunghwan Kim

http://www.w3.org/2001/XMLSchema#string

P2860

Engineering and characterization of a superfolder green fluorescent protein.

New opportunities for an ancient material.

RETRACTED: Stabilization of vaccines and antibiotics in silk and eliminating the cold chain.

Review physical and chemical aspects of stabilization of compounds in silk.

Silk materials--a road to sustainable high technology.

Spectral analysis of induced color change on periodically nanopatterned silk films.

Bioactive silk protein biomaterial systems for optical devices.

Protein-protein nanoimprinting of silk fibroin films.

Stabilization and release of enzymes from silk films.

Rapid nanoimprinting of silk fibroin films for biophotonic applications

P2888

P304

306-310

http://www.w3.org/2001/XMLSchema#string

P31

scholarly article

P356

10.1038/NNANO.2014.47

http://www.w3.org/2001/XMLSchema#string

P407

P433

4

http://www.w3.org/2001/XMLSchema#string

P478

9

http://www.w3.org/2001/XMLSchema#string

P50

Fiorenzo Omenetto

Benedetto Marelli

David L. Kaplan

P577

2014-03-23T00:00:00Z

http://www.w3.org/2001/XMLSchema#dateTime

P698

24658173

http://www.w3.org/2001/XMLSchema#string