A microstructural approach toward the effect of thickness on semiconductor-to-metal transition characteristics of VO2 epilayers
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A microstructural approach toward the effect of thickness on semiconductor-to-metal transition characteristics of VO2 epilayers
description
im April 2014 veröffentlichter wissenschaftlicher Artikel
@de
wetenschappelijk artikel
@nl
наукова стаття, опублікована у квітні 2014
@uk
name
A microstructural approach tow ...... aracteristics of VO2 epilayers
@en
A microstructural approach tow ...... aracteristics of VO2 epilayers
@nl
type
label
A microstructural approach tow ...... aracteristics of VO2 epilayers
@en
A microstructural approach tow ...... aracteristics of VO2 epilayers
@nl
prefLabel
A microstructural approach tow ...... aracteristics of VO2 epilayers
@en
A microstructural approach tow ...... aracteristics of VO2 epilayers
@nl
P2093
P2860
P356
P1476
A microstructural approach tow ...... aracteristics of VO2 epilayers
@en
P2093
P2860
P304
P356
10.1063/1.4872030
P577
2014-04-28T00:00:00Z