Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification
about
Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification
description
article
@en
im Januar 2010 veröffentlichter wissenschaftlicher Artikel
@de
wetenschappelijk artikel
@nl
наукова стаття, опублікована в січні 2010
@uk
name
Photoreactive molecular layers ...... and post-exposure modification
@en
Photoreactive molecular layers ...... and post-exposure modification
@nl
type
label
Photoreactive molecular layers ...... and post-exposure modification
@en
Photoreactive molecular layers ...... and post-exposure modification
@nl
prefLabel
Photoreactive molecular layers ...... and post-exposure modification
@en
Photoreactive molecular layers ...... and post-exposure modification
@nl
P2093
P50
P1476
Photoreactive molecular layers ...... and post-exposure modification
@en
P2093
Anna M. Track
Georg Koller
Heinz-Georg Flesch
Michael G. Ramsey
Peter Pacher
Thomas Höfler
Wolfgang Kern
P304
P356
10.1016/J.MATCHEMPHYS.2009.08.065
P577
2010-01-01T00:00:00Z