Evolution of the Potential-Energy Surface of Amorphous Silicon
about
Energy landscape-driven non-equilibrium evolution of inherent structure in disordered material.Optimized energy landscape exploration using the ab initio based activation-relaxation technique.Large loop conformation sampling using the activation relaxation technique, ART-nouveau method.Crossover from Localized to Cascade Relaxations in Metallic Glasses.Evolution of elastic heterogeneity during aging in metallic glasses.Diffusion of point defects in crystalline silicon using the kinetic activation-relaxation technique methodContribution of vacancies to relaxation in amorphous materials: A kinetic activation-relaxation technique studyLong-time relaxation of ion-bombarded silicon studied with the kinetic activation-relaxation technique: Microscopic description of slow aging in a disordered systemReplenish and Relax: Explaining Logarithmic Annealing in Ion-Implantedc-SiFirst stages of silicon oxidation with the activation relaxation techniqueAmorphous silicon under mechanical shear deformations: Shear velocity and temperature effectsThe Activation-Relaxation Technique: ART Nouveau and Kinetic ART
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Evolution of the Potential-Energy Surface of Amorphous Silicon
description
article publié dans la revue scientifique Physical Review Letters
@fr
im Juli 2010 veröffentlichter wissenschaftlicher Artikel
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scientific article published in Physical Review Letters
@en
wetenschappelijk artikel
@nl
наукова стаття, опублікована в липні 2010
@uk
name
Evolution of the Potential-Energy Surface of Amorphous Silicon
@en
Evolution of the Potential-Energy Surface of Amorphous Silicon
@nl
type
label
Evolution of the Potential-Energy Surface of Amorphous Silicon
@en
Evolution of the Potential-Energy Surface of Amorphous Silicon
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prefLabel
Evolution of the Potential-Energy Surface of Amorphous Silicon
@en
Evolution of the Potential-Energy Surface of Amorphous Silicon
@nl
P2860
P1476
Evolution of the Potential-Energy Surface of Amorphous Silicon
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P2093
François Schiettekatte
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P356
10.1103/PHYSREVLETT.105.045503
P407
P577
2010-07-22T00:00:00Z