Roles of Hydrogen in Amorphous Oxide Semiconductor In-Ga-Zn-O: Comparison of Conventional and Ultra-High-Vacuum Sputtering
about
Highly hydrogen-sensitive thermal desorption spectroscopy system for quantitative analysis of low hydrogen concentration (∼1 × 1016 atoms/cm3) in thin-film samples.Effects of residual hydrogen in sputtering atmosphere on structures and properties of amorphous In-Ga-Zn-O thin filmsSolvent-mediated purification of hexa-molybdenum cluster halide, Cs2[Mo6Cl14] for enhanced optical properties
P2860
Roles of Hydrogen in Amorphous Oxide Semiconductor In-Ga-Zn-O: Comparison of Conventional and Ultra-High-Vacuum Sputtering
description
wetenschappelijk artikel
@nl
наукова стаття, опублікована у 2014
@uk
name
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@en
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@nl
type
label
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@en
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@nl
prefLabel
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@en
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@nl
P2093
P356
P1476
Roles of Hydrogen in Amorphous ...... d Ultra-High-Vacuum Sputtering
@en
P2093
Hidenori Hiramatsu
Hideo Hosono
Hideya Kumomi
Isao Sakaguchi
Ken Watanabe
Kenji Nomura
Naoki Ohashi
Takaya Miyase
Toshio Kamiya
P304
Q3085-Q3090
P356
10.1149/2.015409JSS
P577
2014-01-01T00:00:00Z