Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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im August 2018 veröffentlichter wissenschaftlicher Artikel

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wetenschappelijk artikel

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наукова стаття, опублікована в серпні 2018

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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P1476

Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

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Elijah Spears

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Elton Graugnard

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Jennifer E Padilla

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Juan Flores-Estrada

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Sadao Takabayashi

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Scott Sills

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Shohei Kotani

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Wan Kuang

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William L Hughes

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P2860

Folding DNA to create nanoscale shapes and patterns

DNA in a material world

Membrane-assisted growth of DNA origami nanostructure arrays.

The dimensions of DNA in solution.

Self-assembled monolayers of thiolates on metals as a form of nanotechnology.

Extended DLVO theory: electrostatic and non-electrostatic forces in oxide suspensions.

Purification of DNA-origami nanostructures by rate-zonal centrifugation.

Gold nanocrystals with DNA-directed morphologies

pH-Controlled Assembly of DNA Tiles.

Programmably Shaped Carbon Nanostructure from Shape-Conserving Carbonization of DNA.

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2513

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scholarly article

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10.3390/IJMS19092513

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English

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Lizandra C Godwin

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2018-08-24T00:00:00Z

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30149587

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molecular biology

catalysis

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6165417

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