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Q51021571-D9A9ED58-A038-4418-9518-C424717B1B03
Q51021571-D9A9ED58-A038-4418-9518-C424717B1B03
BestRank
Statement
http://www.wikidata.org/entity/statement/Q51021571-D9A9ED58-A038-4418-9518-C424717B1B03
Parallel near-field photolithography with metal-coated elastomeric masks.
P50
Q51021571-D9A9ED58-A038-4418-9518-C424717B1B03
BestRank
Statement
http://www.wikidata.org/entity/statement/Q51021571-D9A9ED58-A038-4418-9518-C424717B1B03
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
c2d7fcc3390f9ce796bdbb40b534137f7776a9ee
P1545
2
http://www.w3.org/2001/XMLSchema#string
P50
Cheng-han Yu