Atomic layer deposition of Al(2)O(3) and ZnO at atmospheric pressure in a flow tube reactor.
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Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions.Influence of Subsurface Hybrid Material Growth on the Mechanical Properties of Atomic Layer Deposited Thin Films on PolymersAtmospheric pressure synthesis of photoluminescent hybrid materials by sequential organometallic vapor infiltration into polyethylene terephthalate fibers
P2860
Atomic layer deposition of Al(2)O(3) and ZnO at atmospheric pressure in a flow tube reactor.
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2011 nî lūn-bûn
@nan
2011 թուականի Յունուարին հրատարակուած գիտական յօդուած
@hyw
2011 թվականի հունվարին հրատարակված գիտական հոդված
@hy
2011年の論文
@ja
2011年論文
@yue
2011年論文
@zh-hant
2011年論文
@zh-hk
2011年論文
@zh-mo
2011年論文
@zh-tw
2011年论文
@wuu
name
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@ast
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@en
type
label
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@ast
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@en
prefLabel
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@ast
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@en
P356
P1476
Atomic layer deposition of Al( ...... essure in a flow tube reactor.
@en
P2093
Jesse S Jur
P304
P356
10.1021/AM100940G
P407
P577
2011-01-25T00:00:00Z