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Resonant Interferometric Lithography beyond the Diffraction LimitQuantum Lithography beyond the Diffraction Limit via Rabi OscillationsHigh visibility first-order subwavelength interference based on light pulse storage via electromagnetically induced transparencyQuantum lithography: status of the fieldDemonstration of interferometric atom-pattern engineering via Rabi oscillations
P2860
description
2006 nî lūn-bûn
@nan
2006年の論文
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2006年学术文章
@wuu
2006年学术文章
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2006年学术文章
@zh-cn
2006年学术文章
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2006年学术文章
@zh-my
2006年学术文章
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2006年學術文章
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2006年學術文章
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name
Quantum lithography with classical light.
@en
Quantum lithography with classical light.
@nl
type
label
Quantum lithography with classical light.
@en
Quantum lithography with classical light.
@nl
prefLabel
Quantum lithography with classical light.
@en
Quantum lithography with classical light.
@nl
P2860
P1476
Quantum lithography with classical light.
@en
P2093
Muthukrishnan A
P2860
P304
P356
10.1103/PHYSREVLETT.96.163603
P407
P577
2006-04-28T00:00:00Z