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NN700164P
NN700164P
http://dx.doi.org/10.1021/NN700164P
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
P356
Q50901899-65CD2D4C-4038-41F9-AA0D-B2988B9F040A
P356
NN700164P
http://dx.doi.org/10.1021/NN700164P