Analysis of electron beam damage of exfoliated MoS₂ sheets and quantitative HAADF-STEM imaging.
about
Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayerAtomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation.Fabrication and atomic structure of size-selected, layered MoS2 clusters for catalysis.Structural characterization of SnS crystals formed by chemical vapour deposition.
P2860
Analysis of electron beam damage of exfoliated MoS₂ sheets and quantitative HAADF-STEM imaging.
description
2014 nî lūn-bûn
@nan
2014 թուականի Յունիսին հրատարակուած գիտական յօդուած
@hyw
2014 թվականի հունիսին հրատարակված գիտական հոդված
@hy
2014年の論文
@ja
2014年論文
@yue
2014年論文
@zh-hant
2014年論文
@zh-hk
2014年論文
@zh-mo
2014年論文
@zh-tw
2014年论文
@wuu
name
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@ast
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@en
type
label
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@ast
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@en
prefLabel
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@ast
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@en
P2093
P2860
P50
P1433
P1476
Analysis of electron beam dama ...... antitative HAADF-STEM imaging.
@en
P2093
Andres M Raya
Giovanni Scavello
Marcelo M Mariscal
Miguel Jose-Yacaman
P2860
P356
10.1016/J.ULTRAMIC.2014.05.004
P577
2014-06-02T00:00:00Z